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Tunable chiroptical response. a) Simulated (left) and experimental (right) ΔChiral reflection intensity between RCP and LCP on three‐layered samples with different twist angles (including clockwise (+θ) and anticlockwise (‐θ) stacking). The thickness of each layer was 80 nm. b) <t>FDTD</t> simulated (left) and experimental measured (right) reflection intensity difference between RCP and LCP with increasing layer numbers while keeping 45° twist between adjacent layers. The thickness of each layer is 40 nm. c) Real components of the in‐plane permittivity and refractive index of a 25% strained PEDOT: Sulf film after chemical reduction (left), and experimental measured chiral reflection intensity difference between RCP and LCP (right) for a two‐layer twist‐stacked system (45° twist and 80 nm layer thickness).
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Tunable chiroptical response. a) Simulated (left) and experimental (right) ΔChiral reflection intensity between RCP and LCP on three‐layered samples with different twist angles (including clockwise (+θ) and anticlockwise (‐θ) stacking). The thickness of each layer was 80 nm. b) <t>FDTD</t> simulated (left) and experimental measured (right) reflection intensity difference between RCP and LCP with increasing layer numbers while keeping 45° twist between adjacent layers. The thickness of each layer is 40 nm. c) Real components of the in‐plane permittivity and refractive index of a 25% strained PEDOT: Sulf film after chemical reduction (left), and experimental measured chiral reflection intensity difference between RCP and LCP (right) for a two‐layer twist‐stacked system (45° twist and 80 nm layer thickness).
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Tunable chiroptical response. a) Simulated (left) and experimental (right) ΔChiral reflection intensity between RCP and LCP on three‐layered samples with different twist angles (including clockwise (+θ) and anticlockwise (‐θ) stacking). The thickness of each layer was 80 nm. b) <t>FDTD</t> simulated (left) and experimental measured (right) reflection intensity difference between RCP and LCP with increasing layer numbers while keeping 45° twist between adjacent layers. The thickness of each layer is 40 nm. c) Real components of the in‐plane permittivity and refractive index of a 25% strained PEDOT: Sulf film after chemical reduction (left), and experimental measured chiral reflection intensity difference between RCP and LCP (right) for a two‐layer twist‐stacked system (45° twist and 80 nm layer thickness).
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Tunable chiroptical response. a) Simulated (left) and experimental (right) ΔChiral reflection intensity between RCP and LCP on three‐layered samples with different twist angles (including clockwise (+θ) and anticlockwise (‐θ) stacking). The thickness of each layer was 80 nm. b) <t>FDTD</t> simulated (left) and experimental measured (right) reflection intensity difference between RCP and LCP with increasing layer numbers while keeping 45° twist between adjacent layers. The thickness of each layer is 40 nm. c) Real components of the in‐plane permittivity and refractive index of a 25% strained PEDOT: Sulf film after chemical reduction (left), and experimental measured chiral reflection intensity difference between RCP and LCP (right) for a two‐layer twist‐stacked system (45° twist and 80 nm layer thickness).
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Tunable chiroptical response. a) Simulated (left) and experimental (right) ΔChiral reflection intensity between RCP and LCP on three‐layered samples with different twist angles (including clockwise (+θ) and anticlockwise (‐θ) stacking). The thickness of each layer was 80 nm. b) <t>FDTD</t> simulated (left) and experimental measured (right) reflection intensity difference between RCP and LCP with increasing layer numbers while keeping 45° twist between adjacent layers. The thickness of each layer is 40 nm. c) Real components of the in‐plane permittivity and refractive index of a 25% strained PEDOT: Sulf film after chemical reduction (left), and experimental measured chiral reflection intensity difference between RCP and LCP (right) for a two‐layer twist‐stacked system (45° twist and 80 nm layer thickness).
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Tunable chiroptical response. a) Simulated (left) and experimental (right) ΔChiral reflection intensity between RCP and LCP on three‐layered samples with different twist angles (including clockwise (+θ) and anticlockwise (‐θ) stacking). The thickness of each layer was 80 nm. b) <t>FDTD</t> simulated (left) and experimental measured (right) reflection intensity difference between RCP and LCP with increasing layer numbers while keeping 45° twist between adjacent layers. The thickness of each layer is 40 nm. c) Real components of the in‐plane permittivity and refractive index of a 25% strained PEDOT: Sulf film after chemical reduction (left), and experimental measured chiral reflection intensity difference between RCP and LCP (right) for a two‐layer twist‐stacked system (45° twist and 80 nm layer thickness).
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Tunable chiroptical response. a) Simulated (left) and experimental (right) ΔChiral reflection intensity between RCP and LCP on three‐layered samples with different twist angles (including clockwise (+θ) and anticlockwise (‐θ) stacking). The thickness of each layer was 80 nm. b) <t>FDTD</t> simulated (left) and experimental measured (right) reflection intensity difference between RCP and LCP with increasing layer numbers while keeping 45° twist between adjacent layers. The thickness of each layer is 40 nm. c) Real components of the in‐plane permittivity and refractive index of a 25% strained PEDOT: Sulf film after chemical reduction (left), and experimental measured chiral reflection intensity difference between RCP and LCP (right) for a two‐layer twist‐stacked system (45° twist and 80 nm layer thickness).
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Tunable chiroptical response. a) Simulated (left) and experimental (right) ΔChiral reflection intensity between RCP and LCP on three‐layered samples with different twist angles (including clockwise (+θ) and anticlockwise (‐θ) stacking). The thickness of each layer was 80 nm. b) FDTD simulated (left) and experimental measured (right) reflection intensity difference between RCP and LCP with increasing layer numbers while keeping 45° twist between adjacent layers. The thickness of each layer is 40 nm. c) Real components of the in‐plane permittivity and refractive index of a 25% strained PEDOT: Sulf film after chemical reduction (left), and experimental measured chiral reflection intensity difference between RCP and LCP (right) for a two‐layer twist‐stacked system (45° twist and 80 nm layer thickness).

Journal: Advanced Materials (Deerfield Beach, Fla.)

Article Title: Broadband Chiroptics with Twist‐stacked Hyperbolic Conducting Polymer Thin Films

doi: 10.1002/adma.202417024

Figure Lengend Snippet: Tunable chiroptical response. a) Simulated (left) and experimental (right) ΔChiral reflection intensity between RCP and LCP on three‐layered samples with different twist angles (including clockwise (+θ) and anticlockwise (‐θ) stacking). The thickness of each layer was 80 nm. b) FDTD simulated (left) and experimental measured (right) reflection intensity difference between RCP and LCP with increasing layer numbers while keeping 45° twist between adjacent layers. The thickness of each layer is 40 nm. c) Real components of the in‐plane permittivity and refractive index of a 25% strained PEDOT: Sulf film after chemical reduction (left), and experimental measured chiral reflection intensity difference between RCP and LCP (right) for a two‐layer twist‐stacked system (45° twist and 80 nm layer thickness).

Article Snippet: The numerical simulations were performed using the finite‐difference time‐domain FDTD) method using the commercial software Ansys Lumerical FDTD ( https://www.ansys.com/products/photonics/fdtd ).

Techniques: Refractive Index